Metallization method

• Main Authors: HAGA MITSURU, CHEN CHIEN-LUNG
• Format: Patent
• Language: Chinese; English
• Published: 05.01.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; CINEMATOGRAPHY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Disclosed herein is a metallization process comprising (a) forming an underlayer on a first surface of a substrate from an underlayer composition comprising: a first polymer comprising an acid-labile group and a sensitizing group wherein (i) the first polymer contains a sensitizing group or (ii) a compound different from the first polymer contains a sensitizing group; wherein the bottom layer has a first thickness; (b) forming a photoresist layer from a photoresist composition on the underlayer, the photoresist composition comprising: a second polymer containing an acid labile group, and a photoacid generator; wherein the photoresist layer has a second thickness; (c) patterning the photoresist layer to an activation radiation; and (d) developing the exposed photoresist layer with an alkaline developer. 本文公开了一种金属化方法，其包括(a)在基底的第一表面上由底层组合物形成底层，该底层组合物包含：含有酸不稳定基团和敏化基团的第一聚合物，其中(i)第一聚合物含有敏化基团或者(ii)不同于第一聚合物的化合物含有敏化基团；其中底层具有第一厚度；(b)在底层上由光致抗蚀剂组合物形成光致抗蚀剂层，该光致抗蚀剂组合物包含：含有酸不稳定基团的第二聚合物、和光酸产生剂；其中光致抗蚀剂层具有第二厚度；(c)将光致抗蚀剂层以图案方式暴