Production formula of tin-protecting dry film stripping liquid

The invention relates to the technical field of dry film stripping, in particular to a production formula of a tin-protecting dry film stripping liquid, which comprises the following basic components in percentage by mass: 2-5% of alkali, 2-5% of accelerator, 2-5% of penetrant and 2-5% of tin protec...

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Bibliographic Details
Main Authors LIU YUAN, CHEN LIANGZHOU, YIN HONGQIAO, CHEN JIANPING
Format Patent
LanguageChinese
English
Published 05.01.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The invention relates to the technical field of dry film stripping, in particular to a production formula of a tin-protecting dry film stripping liquid, which comprises the following basic components in percentage by mass: 2-5% of alkali, 2-5% of accelerator, 2-5% of penetrant and 2-5% of tin protecting agent. 5-10% of an accelerator, the content of which is 5-10%; the content of the penetrating agent is 0.1 to 10 percent; and the content of the tin protecting agent is 0.1-8%. The tin protecting agent is arranged, the tin protecting agent can form a layer of compact, stable and transparent complex film on the surface of tin, the surface activity of the tin is passivated, the tin is isolated from the air, the effects of preventing tin dissolution and resisting etching are achieved, the photoresist film of the outer-layer PCB positive film process is stripped, and a tin layer is prevented from being attacked under the alkaline condition; and the silicate has certain corrosion inhibition performance on the surfa
Bibliography:Application Number: CN202310964970