APPARATUS AND METHOD FOR DISPENSING THE GAS PHASE OF SOLID PRECURSOR

• Main Authors: TODOROVA VALENTINA, LAURENT, VINCENT, DULPHY HERVE, PLAZA SERGIO
• Format: Patent
• Language: Chinese; English
• Published: 29.12.2023
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to a device for dispensing a gas phase of at least one solid precursor, the apparatus comprises a vessel (1) intended to contain a solid phase (11) of said precursor, first heating means (10) configured to heat the vessel (1) and/or at least a portion of the solid phase (11) in order to form a gaseous phase (12) of said precursor in the vessel (1), and dispensing means (13, 14) fluidly connected to the vessel (1) and configured to dispense the gaseous phase (12) from the vessel (1) to a point of use (60). According to the invention, the device comprises an enclosure (2) having an internal volume within which the vessel (1) and the dispensing means (13, 14) are arranged, said device further comprising second heating means (20) configured to heat at least a portion of the internal volume of the enclosure (2). 本发明涉及一种用于分配至少一种固体前体的气相的设备，所述设备包括旨在容纳所述前体的固相(11)的器皿(1)、被配置成加热器皿(1)和/或固相(11)的至少一部分以便在器皿(1)中形成所述前体的气相(12)的第一加热装置(10)、以及流体连接至器皿(1)并被配置成将气相(12)从器皿(1)分配至使用点(60)的分配装置(13，14)。根据本发明，该设备包括封壳(2)