Linear image sensor, manufacturing method and photoetching mask

• Main Authors: HENG JIAWEI, HOU JINJIAN, MO YAOWU, XU CHEN, CHEN PENG, REN GUANJING
• Format: Patent
• Language: Chinese; English
• Published: 29.12.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTRIC COMMUNICATION TECHNIQUE; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PICTORIAL COMMUNICATION, e.g. TELEVISION

The invention discloses a linear image sensor, a manufacturing method and a photoetching mask, the linear image sensor comprises a first chip area and a second chip area, the first chip area and the second chip area are sequentially arranged in a first preset direction, and the circuit arrangement of the first chip area is the same as the circuit arrangement of the second chip area; the chip further comprises a plurality of pixels and a conductive circuit extending in the second preset direction, the pixels are arranged in the first chip area and the second chip area, the pixels in the first chip area and the second chip area are electrically connected with the conductive circuit, and an included angle is formed between the second preset direction and the first preset direction. The linear image sensor is divided into the first chip area and the second chip area which are the same in circuit arrangement in the first preset direction, and the conductive circuits connected with the pixels extend in the second p