Optimized drying system device of etching cleaning machine

• Main Authors: YU KEJUN, FENG HUA, DAI CONG
• Format: Patent
• Language: Chinese; English
• Published: 29.12.2023
• Subjects: BASIC ELECTRIC ELEMENTS; BLASTING; DRYING; DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; HEATING; LIGHTING; MECHANICAL ENGINEERING; SEMICONDUCTOR DEVICES; WEAPONS

The invention discloses an optimized drying system device of an etching cleaning machine. The optimized drying system device comprises a hot air generating mechanism arranged on a rack, the pipeline assembly is communicated with the hot air generating mechanism; the upper air box assemblies are arranged between the adjacent upper roller assemblies, and the lower air box assemblies are arranged between the adjacent lower roller assemblies; the upper air box assemblies and the lower air box assemblies are respectively communicated with a pipeline assembly, and the upper air box assemblies and the lower air box assemblies are in one-to-one correspondence. The hot air is filtered by the electrostatic dust collection and the filter bag to ensure that the hot air is clean air, so that the whole environment is clean, the surface of the silicon wafer is clean, the surface of the silicon wafer is dry and clean after the silicon wafer is conveyed out of the etching cleaning equipment through the roller, and the subsequ