Preparation method of styrene series compound for 248nm photoresist

• Main Authors: WANG WENJIE, ZHANG CHEN, CHEN YUNZHUANG, YANG PENGBO, ZHANG SHUAI, MA LINDENG, WANG ZIKE
• Format: Patent
• Language: Chinese; English
• Published: 22.12.2023
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention relates to a preparation method of styrene series compounds for 248nm photoresist, and belongs to the technical field of photoresist, and the preparation method comprises the following steps: S1, adding magnesium chips into an anhydrous organic solvent, dropwise adding chlorobenzene compounds under the protection of N2, and carrying out heating reaction to obtain a corresponding intermediate 1 # imgabs0 #; s3, dissolving the intermediate 2 prepared in the step S2 in an organic solvent, adding a catalyst, and carrying out dehydration so as to obtain a target product styrene compound # imgabs2 #, in which an R group represents a structure of-OH, or # imgabs3 #, # imgabs4 # or # imgabs5 #. According to the invention, a chlorobenzene compound, magnesium and acetaldehyde are used as reaction raw materials, and the reaction is carried out under the protection of N2 so as to obtain the intermediate 2 # imgabs1 #; and S3, the intermediate 2 # imgabs1 # is obtained through an addition reaction, and S3, t