Semiconductor device including pad pattern and method of manufacturing same

• Main Authors: CHOI MIN SU, KIM SO-YOUNG
• Format: Patent
• Language: Chinese; English
• Published: 05.12.2023
• Subjects: ELECTRICITY

A semiconductor device and a method of manufacturing a semiconductor device are provided. The semiconductor device includes: a substrate; an active region including a first impurity region and a second impurity region spaced apart from the first impurity region; an isolation region defining an active region; a gate structure intersecting with the active region and extending in a first direction parallel to the substrate; a first pad pattern disposed on the first impurity region; a second pad pattern disposed on the second impurity region; a bit line disposed on the first pad pattern and extending in a second direction, where the second direction is perpendicular to the first direction and parallel to the substrate; and a contact structure on the second pad pattern, in which the second pad pattern has a first side surface and a second side surface opposite to each other in the first direction, both the first side surface and the second side surface being curved along a plane parallel to the substrate. 提供了一种半导体