Method for preparing pink diamond based on high-temperature low-pressure equipment
The invention discloses a method for preparing pink diamonds based on high-temperature and low-pressure equipment. The method comprises the following steps: selecting a diamond base material; performing plasma etching on the surface on which the diamond grows; placing the diamond subjected to plasma...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
01.12.2023
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Subjects | |
Online Access | Get full text |
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Summary: | The invention discloses a method for preparing pink diamonds based on high-temperature and low-pressure equipment. The method comprises the following steps: selecting a diamond base material; performing plasma etching on the surface on which the diamond grows; placing the diamond subjected to plasma etching into a reaction chamber of MPCVD growth equipment to grow; removing the grown diamond from the MPCVD growth apparatus while still in a heat sink holder; irradiating the diamond by using a high-energy electron beam; and carrying out annealing treatment through high-temperature and low-pressure equipment to obtain the stable pink diamond. In the irradiation color changing process of the diamond, the pretreatment process and the annealing process are introduced in sequence, so that the surface damage of the base material is minimized, the crystal quality is improved, and the prepared diamond is small in color difference, good in repeatability and stability, small in-batch and inter-batch difference, more stab |
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Bibliography: | Application Number: CN202311120644 |