Substrate processing apparatus

• Main Authors: WANG ZHIDA, NISHIDE MOTOI, UEHARA DAIKI, OSHIMA KAZUMA
• Format: Patent
• Language: Chinese; English
• Published: 28.11.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The invention provides a substrate processing apparatus for processing a substrate, which can inhibit moisture from contacting with the substrate held on a carrying unit. A mounting unit (40) of a substrate processing apparatus according to the present invention holds an unprocessed substrate transferred from a graduator manipulator to a center manipulator and a processed substrate transferred from the center manipulator to the graduator manipulator. The mounting unit (40) is provided with a housing (411), a first opening/closing part (413), and a second opening/closing part (414). The housing (411) can accommodate a plurality of substrates (9) in an internal space (400) to which a low-humidity gas having a lower humidity than the atmosphere is supplied. The first opening/closing part (413) opens/closes a processing module-side portion of the housing (411). The second opening and closing part (414) is driven independently of the first opening and closing part (413) to open and close a part on the graduator mo