Waveguide preparation process

• Main Authors: TANG JI, CHANG YUEXIN, YIN ZHIJUN, CUI GUOXIN, YE ZHILIN, XU QICHENG
• Format: Patent
• Language: Chinese; English
• Published: 21.11.2023
• Subjects: OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PHYSICS

The invention discloses a waveguide preparation process. The process comprises the following steps: presetting a waveguide structure mask layout and an overlay mask pattern for waveguide end face trimming, and preparing a substrate; preparing a waveguide material layer on the substrate; according to the waveguide structure mask layout, forming a first mask layer and a first to-be-etched area of the waveguide material layer on the surface of the waveguide material layer by adopting a photoetching process; etching a first to-be-etched region of the waveguide material layer by adopting an etching process to form a waveguide; forming a second mask layer and a second to-be-etched area of the waveguide material layer on the surface of the waveguide material layer by adopting the photoetching process according to the overlay mask plate pattern trimmed by the waveguide end face; and etching the second to-be-etched region of the waveguide material layer by adopting an etching process to form a new waveguide end face.