Dispersion equipment, dispergation method and separation system

The invention discloses peptizing equipment, a peptizing method and a separation system. The peptizing equipment comprises a rack, and a material storage mechanism, a material carrying mechanism, a material transferring mechanism and an irradiation mechanism which are arranged on the rack, the stora...

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Bibliographic Details
Main Authors LI JUN, SHI XINXING, QIU HONGYI, ZHU QIANG
Format Patent
LanguageChinese
English
Published 14.11.2023
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Summary:The invention discloses peptizing equipment, a peptizing method and a separation system. The peptizing equipment comprises a rack, and a material storage mechanism, a material carrying mechanism, a material transferring mechanism and an irradiation mechanism which are arranged on the rack, the storage mechanism is provided with a storage space for placing a wafer assembly; the material loading mechanism is located below the material storage mechanism, and the material loading mechanism is provided with a bearing space for placing a wafer assembly; the material transferring mechanism is used for transferring the wafer assembly between the storage space and the bearing space; the irradiation mechanism is arranged corresponding to the material carrying mechanism, and a light-emitting area of the irradiation mechanism can at least cover the bearing space. According to the invention, the whole dispergation process of the wafer assembly does not need to be manually operated, the working efficiency is higher, the (r
Bibliography:Application Number: CN202311031629