Super-resolution laser direct writing method and device based on optical/chemical three-dimensional dark spots

• Main Authors: KUANG CUIFANG, ZHANG LIANG, FAN WUSHEN, SHEN XIAOMING, LIU XI, DING CHENLIANG, TANG MENGBO, LIU XU
• Format: Patent
• Language: Chinese; English
• Published: 14.11.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention discloses a super-resolution laser direct writing method and device based on optical/chemical three-dimensional dark spots. According to the method, three beams of laser are used, the photoresist is focused and irradiated through a solid spot and a hollow spot respectively, the three beams of laser are aligned in the center of a three-dimensional space, and the STED characteristic of a photoinitiator and limitation of an inhibitor on free radical diffusion are utilized, so that the minimum line width of sub-50nm and the minimum period of sub-100nm in the photoresist are obtained. Compared with the prior art, the method has the advantages that edge polymerization is inhibited, free radical diffusion is prevented by the inhibitor, the line width is further reduced, the inscribing precision and the resolution are improved, and the method is expected to be applied to the aspects of preparation of sensing devices, metamaterials, masks and the like. 本发明公开了一种基于光学/化学三维暗斑的超分辨激光直写方法和装置。本发明使用三束激光，分别以实心斑和空心