Semiconductor silicon wafer etching device

• Main Authors: QIU SHAOLING, LI DAN, YIN HUI
• Format: Patent
• Language: Chinese; English
• Published: 10.11.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The invention provides a semiconductor silicon wafer etching device which comprises an etching device body, the etching device body comprises a fixing box, a supporting box is fixed to the top of the fixing box, a control box is fixedly installed at the top of the supporting box, a fixing assembly is movably installed between the fixing box and the supporting box, and the fixing assembly comprises a fixing base. According to the semiconductor silicon wafer etching device, the limiting plate is in contact with the silicon wafer through the balls, when the silicon wafer rotates on the limiting plate, the balls can reduce the friction force between the silicon wafer and the limiting plate, damage caused by long-time friction of the silicon wafer is avoided, in addition, the drain pipe sprays clean water in the later period, and after the storage rack is separated from etching liquid in the later period, cleaning can be conducted through the clean water; and in addition, the movable frame drives the storage frame