Resistivity correction method for stratigraphic stratum highly-deviated well and horizontal well

The invention discloses a method for correcting resistivity of a highly-deviated well and a horizontal well in a stratigraphic stratum. The method comprises the following steps: (1) selecting a plurality of discrete well deviation data and corresponding resistivity logging response values in the sam...

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Bibliographic Details
Main Authors WAN TIANHAO, QIU JINMAN, PEI HAOCHEN, WU BOSHEN, WU ZHENGUAN, ZHENG CHAO, ZHAO JUN, JIA JIANG
Format Patent
LanguageChinese
English
Published 10.11.2023
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Summary:The invention discloses a method for correcting resistivity of a highly-deviated well and a horizontal well in a stratigraphic stratum. The method comprises the following steps: (1) selecting a plurality of discrete well deviation data and corresponding resistivity logging response values in the same stratigraphic stratum according to stratigraphic data, well deviation data and resistivity logging data; (2) fitting the selected data set according to a given correction model, and determining values of r0, r90 and B; (3) calculating correction coefficients alpha (theta) of target layers with different measurement depths in combination with well deviation data; (4) deducing according to the definition of the correction coefficient # imgabs0 # to obtain a correction model # imgabs1 # of the resistivity curve; and (5) correcting the resistivity of the highly-deviated well and the horizontal well in the stratigraphic anisotropic stratum according to the correction model. According to the method, resistivity logging
Bibliography:Application Number: CN202310888743