Polymer-based stress sensing photonic device

• Main Authors: WANG YINGJIE, LI HONGQIANG, CAO MENGWEI, REN FENG, LIN ZHILIN
• Format: Patent
• Language: Chinese; English
• Published: 10.11.2023
• Subjects: ADHESIVES; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; CORRECTING FLUIDS; DYES; FILLING PASTES; INKS; MEASURING; MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PHYSICS; POLISHES; TESTING; USE OF MATERIALS THEREFOR; WOODSTAINS

The invention discloses a polymer-based stress sensing photonic device which monitors stress in an optical sensing mode and comprises a polymer-based upper cladding, a polymer-based lower cladding and a polymer waveguide Bragg grating core layer arranged in the upper cladding and the lower cladding. Through the selection of materials and film thickness, the stress-induced effective refractive index change is far smaller than the stress-induced grating period length change, so that the change from the stress to the effective refractive index is ignored, and the central wavelength change is linearly related to the grating period length change; the result shows that the detectable stress range of the stress sensing photonic device is 0-20kPa, the sensitivity is not less than 2nm/kPa, and the precision is 1kPa. Compared with the prior art, the polymer-based stress sensing photonic device has the advantages of electromagnetic interference resistance, high sensitivity, good output linearity and easiness in integrat