Base station of cleaning device and cleaning system

• Main Authors: WANG YISONG, REN HUAIQIANG
• Format: Patent
• Language: Chinese; English
• Published: 10.11.2023
• Subjects: COFFEE MILLS; DOMESTIC ARTICLES OR APPLIANCES; DOMESTIC WASHING OR CLEANING; FURNITURE; HUMAN NECESSITIES; SPICE MILLS; SUCTION CLEANERS IN GENERAL

The invention discloses a base station of a cleaning device and a cleaning system. The base station comprises a pipeline assembly used for being connected with the cleaning device and the sewer pipe, and dirt generated by the cleaning device is discharged to the sewer pipe through the pipeline assembly. The base station further comprises a pollution discharge assembly which is used for outputting pollution discharge fluid to the pipeline assembly so that dirt in the pipeline assembly can be discharged to a sewer pipe through the pollution discharge fluid. In other words, the sewage discharging fluid is output to the pipeline assembly through the sewage discharging assembly, so that the dirt in the pipeline assembly is pressurized and discharged to the sewer pipe, the dirt can be completely discharged as much as possible, and the risk that the pipeline assembly and the sewer pipe are blocked can be reduced. 本申请公开了一种清洁装置的基站以及清洁系统。该基站包括用于连接清洁装置以及下水管的管路组件，清洁装置产生的脏污通过管路组件排放至下水管。该基站还包括排污组件，排污组件用于向管路组件输出排污流体，以通过该排污流