Ion beam diameter adjusting device and control method

• Main Authors: ZHAO SHIYAN, HUANG SILING, WANG DASEN, GUO HAILIN, NIE FENGMING, XIA CHAOXIANG, ZHANG XU, PEI NING
• Format: Patent
• Language: Chinese; English
• Published: 07.11.2023
• Subjects: BASIC ELECTRIC ELEMENTS; DRESSING OR CONDITIONING OF ABRADING SURFACES; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; PERFORMING OPERATIONS; POLISHING; TRANSPORTING

An ion beam diameter adjusting device comprises a substrate and is characterized in that a plurality of diaphragm bases are arranged at the bottom of one end of the substrate, diaphragms are fixed to the diaphragm bases, magnetic bases capable of being fixed to the front end of an ion source are arranged at the tail ends of the diaphragms, diaphragm small holes are formed in the middles of the diaphragms, and connecting pieces are arranged at the bottom of the other end of the substrate. A Faraday cup is arranged at the bottom of the connecting piece, a Faraday cup small hole is formed in the middle of the Faraday cup, and a substrate locking screw is arranged on the substrate. The diaphragm with the magnetic base is adopted, rapid fixation of the diaphragm and the ion source can be achieved, multiple sets of diaphragms with different apertures are arranged in the vacuum cavity, the purpose of automatically replacing the diaphragms without opening the vacuum cavity is achieved, and the requirement for adjusti