Epoxy POSS (polyhedral oligomeric silsesquioxane) modified benzoxazine/ethylene propylene diene monomer ablation-resistant composite material and preparation method thereof

• Main Authors: JIA HONGBING, WEN YANWEI, FU QUANSHENG, CHEN MENGHAN
• Format: Patent
• Language: Chinese; English
• Published: 07.11.2023
• Subjects: CHEMISTRY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP

The invention discloses an epoxy POSS (polyhedral oligomeric silsesquioxane) modified benzoxazine/ethylene propylene diene monomer ablation-resistant composite material and a preparation method thereof. The composite material is prepared from the following raw materials in parts by weight: 100 parts of ethylene propylene diene monomer, 10-20 parts of benzoxazine resin, 1-2 parts of epoxy POSS, 4-6 parts of zinc oxide, 1-3 parts of stearic acid, 30-40 parts of flame-retardant filler, 3-5 parts of a coupling agent, 1-2 parts of a vulcanization accelerator and 3-5 parts of a vulcanizing agent. The benzoxazine resin is subjected to epoxy POSS modification, so that the compatibility of the benzoxazine resin and the ethylene propylene diene monomer is obviously improved, the benzoxazine resin and the EPDM can generate proper crosslinking sites, and the prepared composite material has excellent physical and mechanical properties and ablation resistance and can be used in the field of aerospace thermal protection. 本发