Cerium oxide particles, method for production thereof and use thereof in chemical mechanical polishing

The present invention relates to cerium oxide particles having a roughness index (RI) of at least 5, to a method for the production thereof, and to the use thereof in chemical mechanical polishing applications. # imgabs0 # 本发明涉及粗糙度指数(RI)至少为5的氧化铈粒子、其制造方法、以及其在化学机械研磨应用中的用途。#imgabs0#...

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Bibliographic Details
Main Authors RIE, PLISONNEAU MARC, TOTH ROBERT, D ALANCON LAURIANE, BUSSET, VAL
Format Patent
LanguageChinese
English
Published 31.10.2023
Subjects
ADHESIVES
CHEMISTRY
DYES
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
POLISHES
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Summary:The present invention relates to cerium oxide particles having a roughness index (RI) of at least 5, to a method for the production thereof, and to the use thereof in chemical mechanical polishing applications. # imgabs0 # 本发明涉及粗糙度指数(RI)至少为5的氧化铈粒子、其制造方法、以及其在化学机械研磨应用中的用途。#imgabs0#
Bibliography:Application Number: CN202280021021