Vapor deposition mask

• Main Authors: TAMEKAWA MITSUGU, YAMADA TETSUYUKI, YANAGISAWA SYOU, IWAHASHI NAOYA
• Format: Patent
• Language: Chinese; English
• Published: 31.10.2023
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

An object of the present invention is to provide a vapor deposition mask having little damage. The vapor deposition mask comprises: a film-shaped mask main body; a holding frame provided around the mask body; and a connecting member connecting the mask body and the holding frame. The mask body includes a first region having a first pattern portion and a second region surrounding the first region and having a second pattern portion. And a third region surrounding the second region. The first region and the second region are disposed within the reference frame. In addition, a first region of the mask main body of the vapor deposition mask is spaced apart from the second pattern portion, and in the vapor deposition mask, the second region circumscribes the outer shape of the first region of the mask main body. 本发明的一个目的是提供破损少的蒸镀掩模，蒸镀掩模具有：薄膜状的掩模主体；设置在掩模主体的周围的保持框；和连接掩模主体与保持框的连接部件，掩模主体包括：具有第1图案部的第1区域、包围第1区域且具有第2图案部的第2区域；和包围第2区域的第3区域，第1区域和第2区域配置在基准框内。另外，蒸镀掩模的掩模主体的第1区域与第2图案部隔开间隔，此外，蒸镀掩模中，第2区域外接于掩模主体的第1区域的外形。