Low-temperature plasma underground gas treatment device

• Main Authors: HU XIAOLONG, SUN BAOJING, ZHANG WEI
• Format: Patent
• Language: Chinese; English
• Published: 31.10.2023
• Subjects: ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEPARATION; TRANSPORTING

The invention belongs to the technical field of plasma treatment, and particularly relates to a low-temperature plasma underground gas treatment device which comprises an outer shell, an air circulation device, a plasma generation device, an active matter catalysis device, a low-voltage power source...