Low-temperature plasma underground gas treatment device

• Main Authors: HU XIAOLONG, SUN BAOJING, ZHANG WEI
• Format: Patent
• Language: Chinese; English
• Published: 31.10.2023
• Subjects: ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEPARATION; TRANSPORTING

The invention belongs to the technical field of plasma treatment, and particularly relates to a low-temperature plasma underground gas treatment device which comprises an outer shell, an air circulation device, a plasma generation device, an active matter catalysis device, a low-voltage power source, a plasma power source, a control system and a discharging device. The low-temperature plasma underground gas treatment device is simple in composition structure, and the occupied volume can be designed into different sizes according to the required treatment capacity; the walking mechanisms can be hung at upper corners of a mine in a distributed mode or are arranged on a working face in cooperation with the walking mechanisms; a low-temperature plasma technology is adopted, the decomposition reaction is mild, and high temperature cannot be generated. 本发明属于等离子处理技术领域，尤其是涉及一种低温等离子井下瓦斯处理装置，包括外部壳体、空气循环装置、等离子发生装置、活性物催化装置、低压电源、等离子电源、控制系统、排放装置；所述低温等离子井下瓦斯处理装置组成结构简单，占用体积可根据需处理量设计成不同大小；可分布式悬挂于矿井的各上隅角或协同行进机构部署于工作面；采用低温等离子技术