Preparation method for improving hydrogen response performance of hydrogen-induced discoloration film

• Main Authors: FANG HAOLAN, PENG LIMING, WANG TINGYAN, CHEN JUAN, ZHANG ZHEN, ZHONG ZHIYE, GUO HAOMING
• Format: Patent
• Language: Chinese; English
• Published: 24.10.2023
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention discloses a preparation method for improving the hydrogen response performance of a hydrogen-induced discoloration magnesium-based film, which comprises the step of adjusting the argon flow in a magnetron sputtering process to be 20-100sccm in the process of preparing a magnesium-based hydrogen-sensitive reaction layer by adopting magnetron sputtering. According to the method, the collision frequency and the average free path of sputtering atoms can be influenced by regulating and controlling the argon flow in the magnetron sputtering process, so that the growth conditions of the thin film are changed, the microstructure of the thin film is changed, and the hydrogen absorption and dehydrogenation rate of the hydrogen-induced discoloration thin film is conveniently and quickly improved. The method is simple in process, high in repeatability and remarkable in performance improvement, and has an important application prospect in the field of hydrogen sensing. 本发明公开了一种提升氢致变色镁基薄膜氢响应性能的制备方法，包括在采用磁控溅射制