Controlling concentration profiles of deposited films using machine learning

• Main Authors: KEDLAYA, DIWAKAR, AYUDDIN, AYOUT, BARYSHNIKOV ANTON V, JANAKIRAMAN, KARTHIK, VENKATA NARAYANA SHANKARAMURTHY, YANG YI, NITTALA, KRISHNA, HUANG ZUBIN, CHENG RUI
• Format: Patent
• Language: Chinese; English
• Published: 20.10.2023
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Methods and systems are provided for controlling a concentration profile of a deposited film using machine learning. Data associated with a target concentration profile of a film to be deposited on a surface of a substrate during a deposition process for the substrate is provided as input to the tra...