Controlling concentration profiles of deposited films using machine learning

• Main Authors: KEDLAYA, DIWAKAR, AYUDDIN, AYOUT, BARYSHNIKOV ANTON V, JANAKIRAMAN, KARTHIK, VENKATA NARAYANA SHANKARAMURTHY, YANG YI, NITTALA, KRISHNA, HUANG ZUBIN, CHENG RUI
• Format: Patent
• Language: Chinese; English
• Published: 20.10.2023
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Methods and systems are provided for controlling a concentration profile of a deposited film using machine learning. Data associated with a target concentration profile of a film to be deposited on a surface of a substrate during a deposition process for the substrate is provided as input to the trained machine learning model. One or more outputs of the trained machine learning model are obtained. Process recipe data identifying one or more sets of deposition process settings is determined from the one or more outputs. For each set of deposition process settings, an indication of a level of reliability of the respective set of deposition process settings corresponding to a target concentration profile of a film to be deposited on the substrate is also determined. In response to identifying a respective set of deposition process settings having a trust level that meets a trust criterion level, one or more operations of the deposition process are performed according to the respective set of deposition process s