Cleaning device for wafer storage container and cleaning method for wafer storage container

A cleaning device (1) for a wafer storage container is provided with: a cleaning tank (31) capable of accommodating a storage jig (3) that accommodates a wafer storage container (2) having a container main body (11) and a lid body (12); liquid supply nozzles (32A-32H) for supplying a cleaning liquid...

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Bibliographic Details
Main Authors WAKASUGI KATSURO, IWASAKI FUMITOSHI
Format Patent
LanguageChinese
English
Published 13.10.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A cleaning device (1) for a wafer storage container is provided with: a cleaning tank (31) capable of accommodating a storage jig (3) that accommodates a wafer storage container (2) having a container main body (11) and a lid body (12); liquid supply nozzles (32A-32H) for supplying a cleaning liquid or the like into the cleaning tank (31); and a liquid discharge nozzle (34) for discharging the discharged liquid to the outside of the cleaning tank (31). The container body (11) has a rear wall (11A) facing the container opening (11B). The liquid supply nozzles (32A-32H) are provided so as to face the inside of the rear wall (11A) in a storage state in which a container body (11) having a container opening (11B) facing downward is placed on a storage jig (3) and is stored in a cleaning tank (31), and each liquid supply opening (32AA-32HA) for discharging cleaning liquid and the like is provided so as to face the inside of the rear wall (11A). The liquid discharge nozzle (34) is provided so that a discharge openi
Bibliography:Application Number: CN202180094072