N-type battery borosilicate glass cleaning method

• Main Authors: SHI JINCHAO, MA HONGNA, WANG ZIQIAN, WANG PING, WANG HONGFANG, MENG QINGCHAO, LANG FANG, ZHAO XUELING, ZHAI JINYE, PAN MINGCUI, BIN PENGSHUAI
• Format: Patent
• Language: Chinese; English
• Published: 10.10.2023
• Subjects: BASIC ELECTRIC ELEMENTS; CLEANING; CLEANING IN GENERAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; SEMICONDUCTOR DEVICES; TRANSPORTING

The invention provides an N-type battery borosilicate glass cleaning method and an N-type battery borosilicate glass cleaning method, and belongs to the technical field of solar cells. The method comprises the following steps: placing a silicon wafer after boron diffusion on a carrier plate with the front face facing downwards; putting the carrier plate and the silicon wafer into a plasma etching machine, exciting gas containing fluorine ions by the plasma etching machine, and completely etching borosilicate glass on the back surface and the edge of the silicon wafer; and putting the silicon wafer etched by the plasma etching machine and the carrier plate into groove type pickling equipment, and carrying out polishing treatment on the back surface and the edge of the silicon wafer. According to the method, a plasma removal method is adopted, the silicon wafer subjected to boron diffusion is flatly placed on a carrier plate with the front face facing downwards, then the carrier plate is placed in a plasma etch