气浴装置、温控系统以及曝光设备

本发明公开了一种气浴装置、温控系统以及曝光设备，其涉及光刻机技术领域。该气浴装置包括温控本体及匀流件；温控本体设有一次匀化流道及与一次匀化流道分别连通的进气口和出气口；匀流件设于一次匀化流道内，匀流件形成有温控区及与温控区连通的二次匀化流道，二次匀化流道与一次匀化流道连通；一次匀化流道用于使气体形成层流流场；二次匀化流道用于减小温控区中不同位置的流速差值，并使温控区内的流场以层流形式出现，从进气口流至出气口，减小气流扰动对成像质量的影响。本发明改进了气浴装置的结构，通过两级流速匀化、气流流场控制，实现了微环境高精度温度控制，温控温度波动小，局部温度更均匀，有效降低了温控区的流速差值和温差。 T...

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Bibliographic Details
Format Patent
LanguageChinese
Published 21.11.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:本发明公开了一种气浴装置、温控系统以及曝光设备，其涉及光刻机技术领域。该气浴装置包括温控本体及匀流件；温控本体设有一次匀化流道及与一次匀化流道分别连通的进气口和出气口；匀流件设于一次匀化流道内，匀流件形成有温控区及与温控区连通的二次匀化流道，二次匀化流道与一次匀化流道连通；一次匀化流道用于使气体形成层流流场；二次匀化流道用于减小温控区中不同位置的流速差值，并使温控区内的流场以层流形式出现，从进气口流至出气口，减小气流扰动对成像质量的影响。本发明改进了气浴装置的结构，通过两级流速匀化、气流流场控制，实现了微环境高精度温度控制，温控温度波动小，局部温度更均匀，有效降低了温控区的流速差值和温差。 The invention discloses a gas bath device, a temperature control system and exposure equipment, and relates to the technical field of photoetching machines. The air bath device comprises a temperature control body and a flow uniformizing piece. The temperature control body is provided with a primary homogenization flow channel, and an air inlet and an air outlet which are respectively communicated with the primary homogenization flow channel; the flow uniformizing piece is arranged in the primary uniformizing flow channel, a temperature control area and a secondary uniformizing flow channel communicated with the temperature control area are formed in the flow uniformizing piece, and the secondary uniformizing flow c
Bibliography:Application Number: CN202311111066