Linearity measuring method and linearity measuring device
The invention provides a linearity measuring method and a linearity measuring device. The linearity measuring method comprises the steps that a diffraction beam obtained by irradiating a collimated beam to an auxiliary measuring plate is received, the auxiliary measuring plate is provided with a plu...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
29.09.2023
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Subjects | |
Online Access | Get full text |
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Summary: | The invention provides a linearity measuring method and a linearity measuring device. The linearity measuring method comprises the steps that a diffraction beam obtained by irradiating a collimated beam to an auxiliary measuring plate is received, the auxiliary measuring plate is provided with a plurality of open holes which are arranged in parallel at intervals in the preset direction, and each open hole is provided with two edges oppositely arranged in the preset direction; the diffraction light beam is converted into a waveform signal, the waveform signal comprises a plurality of diffraction peak groups, and one diffraction peak group corresponds to two edges of one hole; and obtaining a first data set according to the horizontal coordinates of the plurality of diffraction peak groups, obtaining a second data set according to the coordinates of the plurality of edges in the preset direction, and obtaining the linearity of the sensor according to the first data set and the second data set. According to the |
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Bibliography: | Application Number: CN202311099382 |