Handling anomaly identification using measurement violation analysis

• Main Authors: WARREN ERIC J, NAHAS SELIM, RAGAM, VISHALI, CORRAL RANDY REINARDO, WANG SHIJING, DOCKS JOSEPH JAMES, RAGOT CHARLES, REEVES CHRISTOPHER
• Format: Patent
• Language: Chinese; English
• Published: 22.09.2023
• Subjects: CONTROL OR REGULATING SYSTEMS IN GENERAL; CONTROLLING; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS; PHYSICS; REGULATING

The subject matter of this specification may be implemented in a method, system, and/or apparatus, etc., to receive current metrology data of an operation performed on a current sample in a manufacturing process. The metrology data includes a current value of the parameter at each of one or more locations of the current sample. The method includes obtaining a reference rate of change of a parameter value of the parameter at each of the one or more locations. The method further includes determining a current rate of change of the parameter value at each of the one or more locations. The current rate of change is associated with the current sample. The method further includes comparing the current rate of change of the parameter value to a reference rate of change of the parameter value and identifying an abnormal condition of the manufacturing process based on the comparison. 本说明书的主题可以在一种方法、系统和/或装置等中实施，以接收在制造处理中对当前样本进行的操作的当前计量数据。该计量数据包括在当前样本的一个或多个位置的每一个处的参数的当前值。方法包含获得一个或多个位置的每一个位置处的参数的参数值的参考变化率。该方法进一步包含确定一个或多个