Pre-cleaning method for high-efficiency gettering of crystalline silicon heterojunction solar cell

The invention relates to the technical field of silicon wafer processing, and particularly discloses a pre-cleaning method for efficient gettering of a crystalline silicon heterojunction solar cell. The method comprises the steps of pre-cleaning with mixed acid liquor, texturing, post-cleaning with...

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Main Authors DENG YIXIONG, ZHANG JIAN'AN, WANG HAO
Format Patent
LanguageChinese
English
Published 22.09.2023
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Abstract The invention relates to the technical field of silicon wafer processing, and particularly discloses a pre-cleaning method for efficient gettering of a crystalline silicon heterojunction solar cell. The method comprises the steps of pre-cleaning with mixed acid liquor, texturing, post-cleaning with mixed acid liquor and hydrofluoric acid and the like, and the obtained silicon wafer is subjected to phosphorus diffusion gettering treatment. The mixed acid liquid can micro-corrode the surface of the silicon wafer to remove metal impurities on the surface of the silicon wafer, then the surface of the silicon wafer is in a pyramid shape in the micro-corrosion texturing process, the specific surface area of the silicon wafer is increased, and therefore the gettering area is enlarged, meanwhile, due to the fact that texturing adopts a micro-corrosion texturing mode, a mechanical damage area on the surface of the silicon wafer is reserved, and the gettering efficiency is improved. Through the cooperation of texturing
AbstractList The invention relates to the technical field of silicon wafer processing, and particularly discloses a pre-cleaning method for efficient gettering of a crystalline silicon heterojunction solar cell. The method comprises the steps of pre-cleaning with mixed acid liquor, texturing, post-cleaning with mixed acid liquor and hydrofluoric acid and the like, and the obtained silicon wafer is subjected to phosphorus diffusion gettering treatment. The mixed acid liquid can micro-corrode the surface of the silicon wafer to remove metal impurities on the surface of the silicon wafer, then the surface of the silicon wafer is in a pyramid shape in the micro-corrosion texturing process, the specific surface area of the silicon wafer is increased, and therefore the gettering area is enlarged, meanwhile, due to the fact that texturing adopts a micro-corrosion texturing mode, a mechanical damage area on the surface of the silicon wafer is reserved, and the gettering efficiency is improved. Through the cooperation of texturing
Author WANG HAO
DENG YIXIONG
ZHANG JIAN'AN
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DocumentTitleAlternate 晶硅异质结太阳能电池高效吸杂的前清洗方法
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Snippet The invention relates to the technical field of silicon wafer processing, and particularly discloses a pre-cleaning method for efficient gettering of a...
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ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Title Pre-cleaning method for high-efficiency gettering of crystalline silicon heterojunction solar cell
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