Pre-cleaning method for high-efficiency gettering of crystalline silicon heterojunction solar cell
The invention relates to the technical field of silicon wafer processing, and particularly discloses a pre-cleaning method for efficient gettering of a crystalline silicon heterojunction solar cell. The method comprises the steps of pre-cleaning with mixed acid liquor, texturing, post-cleaning with...
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Format | Patent |
Language | Chinese English |
Published |
22.09.2023
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Abstract | The invention relates to the technical field of silicon wafer processing, and particularly discloses a pre-cleaning method for efficient gettering of a crystalline silicon heterojunction solar cell. The method comprises the steps of pre-cleaning with mixed acid liquor, texturing, post-cleaning with mixed acid liquor and hydrofluoric acid and the like, and the obtained silicon wafer is subjected to phosphorus diffusion gettering treatment. The mixed acid liquid can micro-corrode the surface of the silicon wafer to remove metal impurities on the surface of the silicon wafer, then the surface of the silicon wafer is in a pyramid shape in the micro-corrosion texturing process, the specific surface area of the silicon wafer is increased, and therefore the gettering area is enlarged, meanwhile, due to the fact that texturing adopts a micro-corrosion texturing mode, a mechanical damage area on the surface of the silicon wafer is reserved, and the gettering efficiency is improved. Through the cooperation of texturing |
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AbstractList | The invention relates to the technical field of silicon wafer processing, and particularly discloses a pre-cleaning method for efficient gettering of a crystalline silicon heterojunction solar cell. The method comprises the steps of pre-cleaning with mixed acid liquor, texturing, post-cleaning with mixed acid liquor and hydrofluoric acid and the like, and the obtained silicon wafer is subjected to phosphorus diffusion gettering treatment. The mixed acid liquid can micro-corrode the surface of the silicon wafer to remove metal impurities on the surface of the silicon wafer, then the surface of the silicon wafer is in a pyramid shape in the micro-corrosion texturing process, the specific surface area of the silicon wafer is increased, and therefore the gettering area is enlarged, meanwhile, due to the fact that texturing adopts a micro-corrosion texturing mode, a mechanical damage area on the surface of the silicon wafer is reserved, and the gettering efficiency is improved. Through the cooperation of texturing |
Author | WANG HAO DENG YIXIONG ZHANG JIAN'AN |
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DocumentTitleAlternate | 晶硅异质结太阳能电池高效吸杂的前清洗方法 |
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RelatedCompanies | JETION SOLAR (JIANGSU) CO., LTD |
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Snippet | The invention relates to the technical field of silicon wafer processing, and particularly discloses a pre-cleaning method for efficient gettering of a... |
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Title | Pre-cleaning method for high-efficiency gettering of crystalline silicon heterojunction solar cell |
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