Projection objective for 0.35 micron photoetching

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Bibliographic Details
Main Authors HANMIN YAO, WUMEI LIN, XUNAN CHEN
Format Patent
LanguageChinese
English
Published 22.09.2004
Edition7
Subjects
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Bibliography:Application Number: CN2000109948