Measurement substrate and measurement method

• Main Authors: LAURENT THIBAULT SIMON MATHIEU, BLOKS RUUD H M J, DE LA ROSSET JOHANNES PETRUS MARIA, MAKINWA KOFI A. A, NETIAFF, STOYAN, VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS, NEEFS, PETRUS, J
• Format: Patent
• Language: Chinese; English
• Published: 22.09.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; MEASURING QUANTITY OF HEAT; MEASURING TEMPERATURE; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TESTING; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR

A measurement substrate and method for measuring conditions in an apparatus for processing a production substrate during operation of the apparatus. The measurement substrate includes: a body having a size compatible with the device; a plurality of sensor modules embedded in the body, each sensor module comprising: a sensor configured to generate an analog measurement signal; an analog-to-digital converter to generate digital measurement information from the analog measurement signal; and a module controller configured to output digital measurement information; and a central control module configured to receive the digital measurement information from each of the module controllers and communicate the digital measurement information to an external device. 一种用于测量关于用于在设备的操作期间处理生产衬底的设备中的条件的测量衬底和方法。测量衬底包括：主体，具有与设备相兼容的尺寸；内嵌在主体中的多个传感器模块，每一传感器模块包括：传感器，配置成产生模拟测量信号；模数转换器，用以从该模拟测量信号产生数字测量信息；和模块控制器，配置成输出数字测量信息；和中心控制模块，配置成接收来自模块控制器中的每一个的数字测量信息且将该数字测量信息通信至外部装置。