Cavity and semiconductor device

• Main Authors: LI CHAOYONG, ZHAO XUE, QI BAOYU, SONG KAIXING, ZHANG WEI, CHEN KUN, HUANG YAODONG, YUE YUXIANG
• Format: Patent
• Language: Chinese; English
• Published: 12.09.2023
• Subjects: BASIC ELECTRIC ELEMENTS; CLEANING; CLEANING IN GENERAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; SEMICONDUCTOR DEVICES; TRANSPORTING

The invention provides a cavity, a directional liquid transfer layer is arranged on the inner wall of the top of the cavity, the directional liquid transfer layer is provided with a surface microstructure which is directionally arranged in the liquid transfer direction, and the surface microstructure is at least one of a micro-groove array or a micro-bulge array. The directional liquid transfer layer is arranged on the inner wall of the top of the cavity, so that the top liquid drops are directionally transferred to the edge area, the liquid adsorbed to the top of the cavity is prevented from dripping to the silicon wafer, surface oxidation of the silicon wafer and convergence of residual pollutants are avoided, and the product yield is improved. 本发明提供一种腔体，所述腔体的顶部内壁设置有定向传液层，所述定向传液层具有沿液体传输方向定向排布的表面微结构，所述表面微结构为微凹槽阵列或微凸起阵列中的至少一种。本发明通过于腔体顶部内壁设置定向传液层，使顶部液滴定向传输至边缘区域，避免吸附于腔体顶部的液体滴落至硅片，进而避免硅片表面氧化、残留污染物汇聚，提升产品良率。