Method and system for semiconductor device metrology and detection

• Main Authors: BARAK GILAD, LINDENFELD, ZEE, EV, HAINICK, YAIR, LEVANT BORIS, SHAFIR DROR, HILLMAN YURI, SCHLEIFER ELAD, AMA MICHAEL, FERBER, SMADAR
• Format: Patent
• Language: Chinese; English
• Published: 12.09.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

The invention relates to a method and system for semiconductor device metrology and detection. The method for semiconductor device metrology includes: creating a time domain representation of wavelength domain measurement data of light reflected by a patterned structure of a semiconductor device; se...