Method for etching at least one surface of plastic substrate
The invention relates to a method for etching at least one surface of a plastic substrate, said method comprising steps (A) to (C), where step (C) is an etching step comprising contact with an etching composition. The etching composition includes permanganate ions and phosphoric acid each within a s...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
08.09.2023
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a method for etching at least one surface of a plastic substrate, said method comprising steps (A) to (C), where step (C) is an etching step comprising contact with an etching composition. The etching composition includes permanganate ions and phosphoric acid each within a specifically defined concentration range.
本发明涉及一种用于蚀刻塑料衬底的至少一个表面的方法,所述方法包括步骤(A)到(C),其中步骤(C)为包含与蚀刻组合物的接触的蚀刻步骤。所述蚀刻组合物包括各自在特定界定的浓度范围内的高锰酸根离子及磷酸。 |
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Bibliography: | Application Number: CN202180089342 |