Method for etching at least one surface of plastic substrate

• Main Authors: FELS CARL CHRISTIAN, FINN, FRANK, SZAMKOWSKI RALF-ERIC
• Format: Patent
• Language: Chinese; English
• Published: 08.09.2023
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to a method for etching at least one surface of a plastic substrate, said method comprising steps (A) to (C), where step (C) is an etching step comprising contact with an etching composition. The etching composition includes permanganate ions and phosphoric acid each within a specifically defined concentration range. 本发明涉及一种用于蚀刻塑料衬底的至少一个表面的方法，所述方法包括步骤(A)到(C)，其中步骤(C)为包含与蚀刻组合物的接触的蚀刻步骤。所述蚀刻组合物包括各自在特定界定的浓度范围内的高锰酸根离子及磷酸。