Cellular automaton method for simulating continuous dynamic recrystallization behavior of alloy

• Main Authors: LIN YONGCHENG, WANG YUSHENG, WU GUICHENG, CHEN MINGSONG, ZENG NINGFU, WAN MIAO
• Format: Patent
• Language: Chinese; English
• Published: 01.09.2023
• Subjects: CALCULATING; COMPUTING; COUNTING; ELECTRIC DIGITAL DATA PROCESSING; INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTEDFOR SPECIFIC APPLICATION FIELDS; PHYSICS

The invention discloses a cellular automaton method for simulating a continuous dynamic recrystallization behavior of an alloy. The method comprises the following steps: (1) generating an initial microstructure; (2) carrying out cellular topology deformation calculation, and updating a cellular state variable; (3) establishing a dislocation density evolution model, wherein sub-crystal nucleation is generated in the original crystal grains; (4) establishing a subcrystal rotation and growth model, and calculating subcrystal orientation change and small-angle grain boundary migration rate; (5) establishing a high-angle grain boundary migration model, and calculating the growth speed of newly generated recrystallized grains; and (6) outputting the crystal grain topological morphology, the average subcrystal/crystal grain size, the recrystallization fraction and the small-angle/high-angle crystal boundary fraction. According to the cellular automaton method for simulating the continuous dynamic recrystallization b