Exposure method and exposure device

• Main Authors: ISO DAISUKE, NAKAI KAZUHIRO
• Format: Patent
• Language: Chinese; English
• Published: 25.08.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

Provided is an exposure method capable of compensating for exposure without lowering positional accuracy even in the presence of an exposure head that cannot be exposed due to defects or the like. The exposure method includes: a step of irradiating light from a first exposure head toward a first exposure region in a first exposure pattern; irradiating light from the first exposure head toward the second exposure region in a second exposure pattern; irradiating light from the second exposure head toward the third exposure region in a third exposure pattern; and irradiating light from the second exposure head toward the fourth exposure region in a fourth exposure pattern. 本发明提供一种曝光方法，即使在存在因不良情况等而不能曝光的曝光头的情况下，也能够补偿曝光而不降低位置精度。曝光方法包括：从第一曝光头朝向第一曝光区域以第一曝光图案照射光的工序；从第一曝光头朝向第二曝光区域以第二曝光图案照射光的工序；从第二曝光头朝向第三曝光区域以第三曝光图案照射光的工序；以及从第二曝光头朝向第四曝光区域以第四曝光图案照射光的工序。