Novel electrostatic chuck and preparation method thereof

• Main Authors: ZHU SHUNCUN, MA JUNFENG, ZHANG WEIQUAN, REN WEIKANG
• Format: Patent
• Language: Chinese; English
• Published: 22.08.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The invention provides a novel electrostatic chuck. The novel electrostatic chuck comprises a ceramic body; and the plurality of ceramic plates are arranged on the surface of the ceramic machine body. According to the novel electrostatic chuck provided by the invention, a plurality of small-size chucks can be simultaneously integrated on a large ceramic chuck surface, so that a plurality of chucks can simultaneously etch and process a product at a time. The novel ceramic electrostatic chuck provided by the invention can adsorb a plurality of silicon wafers at the same time, can process the plurality of silicon wafers at the same time, has a high requirement on the flatness of the whole ceramic chuck, can process the plurality of silicon wafers in one cavity at one time, and improves the processing efficiency. 本发明提供了一种新型静电吸盘，包括：陶瓷机体；设置在所述陶瓷机体表面的多个陶瓷盘。本发明提供的新型静电吸盘可以通过把多个小尺寸吸盘同时集成到一个大的陶瓷盘面上，可以一次性多个吸盘同时对产品进行刻蚀加工。本发明提供的新型陶瓷静电吸盘能够同时吸附多个硅片，对多个吸片同时加工，对整体陶瓷盘的平面度要求较高，可以在一个腔体内一次性加工多个硅片，提升了加工效率。