Carrier, processing equipment, feeding method of processing equipment and using method of processing equipment

• Main Authors: KANG XU, ZHANG SHENG, SHI SHUPENG, YAN DA
• Format: Patent
• Language: Chinese; English
• Published: 25.07.2023
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to a carrier, processing equipment, a feeding method of the processing equipment and a using method. The carrier includes a frame and a cover. The frame is provided with a treatment space for placing a to-be-treated piece, and an air inlet part, an air outlet part and at least one opening part which are communicated with the inside and the outside of the treatment space; the covering piece is detachably connected with the frame and covers all the opening parts. After the covering piece is assembled on the frame, the covering piece can cover the opening part of the frame, so that the processing space of the frame is only provided with the air inlet part and the opening part which are communicated with each other. The processing space can be used for guiding the introduced gas and enabling the gas quantity in different areas to be consistent as far as possible, so that the uniformity of a film layer formed on the surface of the to-be-processed piece after the to-be-processed piece reacts w