对于碱性过氧化氢水的保护膜形成组成物、半导体装置制造用基板、保护膜的形成方法

• Format: Patent
• Language: Chinese
• Published: 28.02.2025
• Subjects: ADHESIVES; BASIC ELECTRIC ELEMENTS; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; CORRECTING FLUIDS; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FILLING PASTES; INKS; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS THEREFOR; WOODSTAINS

本发明涉及对于碱性过氧化氢水的保护膜形成组成物、半导体装置制造用基板、保护膜的形成方法。本发明的课题为提供一种使用了含有酰亚胺基的聚合物的保护膜形成组成物，其能形成不只是耐热性、基板上形成的图案的填埋、平坦化特性优异，对于基板的密合性亦为良好的保护膜，且能形成具备优良的碱性过氧化氢水耐性的保护膜。一种对于碱性过氧化氢水的保护膜形成组成物，含有(A)，是具有下列通式(1A)表示的含有至少1个以上的氟原子及羟基的重复单元且末端基团为下列通式(1B)及(1C)中的任一者表示的基团的聚合物；及(B)有机溶剂。#imgabs0#式中，R1为下式(1D)表示的基团中的任一者，亦可将2种以上的R1组合使用。#imgabs1# Provided is a composition for forming a protective film using a polymer having an imide group: that is cured under a film-forming condition not only in the air but in an inert gas; that can form a protective film having excellent heat resistance, embedding and planarization ability for a pattern formed on a substrate, and good adhesiveness to the substrate; and that can form a protective film having excellent resistance against an alkaline aqueous hydrogen peroxide. A composition for forming a protective film against an alkaline aqueous hydrogen peroxide, the composition including: (A) a polymer having a repeating unit represented by the following general formula (1A) and having at least one or more fluor