Semiconductor wastewater co-treatment process
The invention discloses a semiconductor wastewater co-treatment process which comprises the following steps: introducing organic wastewater and ammonia-nitrogen wastewater into a first regulating tank to complete homogeneous and average quantity regulation; the grinding wastewater and the fluorine-c...
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Main Authors | , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
25.07.2023
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Subjects | |
Online Access | Get full text |
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Summary: | The invention discloses a semiconductor wastewater co-treatment process which comprises the following steps: introducing organic wastewater and ammonia-nitrogen wastewater into a first regulating tank to complete homogeneous and average quantity regulation; the grinding wastewater and the fluorine-containing wastewater are both introduced into a second adjusting tank, and homogeneous and average adjustment is completed; introducing the acid-base wastewater into a third adjusting tank for acid-base adjustment to complete homogeneous and average adjustment, and respectively introducing effluent into a first neutralizing tank, a second neutralizing tank, a third neutralizing tank and a fourth neutralizing tank; carrying out iron-carbon micro-electrolysis reaction on the effluent of the first neutralizing tank, and enabling the effluent to enter a second neutralizing tank; effluent enters an A/O reaction tank for biochemical reaction, then enters an MBR membrane tank, is treated and then enters a fourth neutraliz |
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Bibliography: | Application Number: CN202310472767 |