Semiconductor wastewater co-treatment process

• Main Authors: ZHANG LING, YUE ZHONGQIU, LIU JUN, XU ZHIXIANG, QU LIN, ZHU CHUNYOU
• Format: Patent
• Language: Chinese; English
• Published: 25.07.2023
• Subjects: CHEMISTRY; METALLURGY; TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE

The invention discloses a semiconductor wastewater co-treatment process which comprises the following steps: introducing organic wastewater and ammonia-nitrogen wastewater into a first regulating tank to complete homogeneous and average quantity regulation; the grinding wastewater and the fluorine-containing wastewater are both introduced into a second adjusting tank, and homogeneous and average adjustment is completed; introducing the acid-base wastewater into a third adjusting tank for acid-base adjustment to complete homogeneous and average adjustment, and respectively introducing effluent into a first neutralizing tank, a second neutralizing tank, a third neutralizing tank and a fourth neutralizing tank; carrying out iron-carbon micro-electrolysis reaction on the effluent of the first neutralizing tank, and enabling the effluent to enter a second neutralizing tank; effluent enters an A/O reaction tank for biochemical reaction, then enters an MBR membrane tank, is treated and then enters a fourth neutraliz