Display device and method of manufacturing same
A display device and a method of manufacturing the same are provided. The display device includes: a substrate; a first semiconductor layer disposed on the substrate; a second semiconductor layer disposed on the first semiconductor layer; an interlayer insulating layer disposed on the second semicon...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
21.07.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A display device and a method of manufacturing the same are provided. The display device includes: a substrate; a first semiconductor layer disposed on the substrate; a second semiconductor layer disposed on the first semiconductor layer; an interlayer insulating layer disposed on the second semiconductor layer and including a plurality of inorganic insulating layers; and a display element disposed on the interlayer insulating layer, in which the plurality of inorganic insulating layers includes an oxide layer, a first nitride layer disposed on the oxide layer and having a first density, and a second nitride layer disposed on the first nitride layer and having a second density lower than the first density.
提供了显示装置和制造显示装置的方法。显示装置包括:基板;第一半导体层,设置在基板上;第二半导体层,设置在第一半导体层上;层间绝缘层,设置在第二半导体层上并且包括多个无机绝缘层;以及显示元件,设置在层间绝缘层上,其中,多个无机绝缘层包括氧化物层、设置在氧化物层上并且具有第一密度的第一氮化物层以及设置在第一氮化物层上并且具有比第一密度低的第二密度的第二氮化物层。 |
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Bibliography: | Application Number: CN202310062154 |