Group III nitride multi-wavelength LED array with etch stop layer
An LED array includes a first mesa including a top surface, at least one first LED including a first p-type layer, a first n-type layer, and a first color active region, and a tunnel junction on the first LED; a second n-type layer on the tunnel junction, the second n-type layer comprising at least...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
14.07.2023
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Subjects | |
Online Access | Get full text |
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Summary: | An LED array includes a first mesa including a top surface, at least one first LED including a first p-type layer, a first n-type layer, and a first color active region, and a tunnel junction on the first LED; a second n-type layer on the tunnel junction, the second n-type layer comprising at least one Al molar fraction gt; 10% of an n-type Group III nitride layer and at least one Al molar fraction lt; and 10% of an n-type group III nitride layer. The LED array also includes an adjacent mesa including a top surface, a first LED, a second LED including a second n-type layer, a second p-type layer, and a second color active region. A first trench separates the first mesa and the adjacent mesa, a cathode metallization in the first trench and in electrical contact with the first and second color active regions of the adjacent mesa, and an anode metallization in contact on the n-type layer of the first mesa and on the anode layer of the adjacent mesa. The devices and methods of making the same include thin film tr |
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Bibliography: | Application Number: CN202180076259 |