Morirpora ovale-nano semiconductor hybrid system, and preparation method and application of morirpora ovale-nano semiconductor hybrid system

The invention provides a preparation method of a rorispora ovale-nano semiconductor hybrid system. The preparation method comprises the following steps: inoculating rorispora ovale into an anaerobic culture medium for anaerobic culture under sterile and anaerobic conditions until the absorbance OD60...

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Main Authors LI XINYUE, LIN ZHANG, ZHANG KEJING, DENG DI, SHI YAN, CHEN JIANXIN, TAN XIAOQIAN, LI RUIJIE, YANG ZHIHUI, CHAI LIYUAN
Format Patent
LanguageChinese
English
Published 14.07.2023
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Summary:The invention provides a preparation method of a rorispora ovale-nano semiconductor hybrid system. The preparation method comprises the following steps: inoculating rorispora ovale into an anaerobic culture medium for anaerobic culture under sterile and anaerobic conditions until the absorbance OD600 of rorispora ovale liquid in the anaerobic culture medium reaches 0.2-0.3; adding a nano semiconductor material into the murine ovale liquid for compounding treatment to obtain a murine ovale compound system; wherein the concentration of the nano semiconductor material in the rorispora ovale bacterial liquid is 0.1 to 1.0 mM; centrifuging the rorispora ovale composite system, separating precipitates, and inoculating the precipitates into a phototrophic culture medium; and adding a hole sacrifice agent into the photosynthetic culture medium to obtain the rorispora ovale-nano semiconductor hybrid system. The hybrid system constructed by the invention can realize high-efficiency and low-consumption carbon sequestrat
Bibliography:Application Number: CN202310431030