Large-depth-of-field uniform line laser generator

• Main Authors: SUN GUOWEN, ZHANG BINGTAO, YIN CHUNLEI
• Format: Patent
• Language: Chinese; English
• Published: 07.07.2023
• Subjects: BASIC ELECTRIC ELEMENTS; DEVICES USING STIMULATED EMISSION; ELECTRICITY

The invention belongs to the field of laser, and relates to a large-depth-of-field uniform line laser generator, a main body structure comprises N luminous light sources and a Powell prism or cylindrical lens combination, N is greater than or equal to 2, and N is a positive integer; a collimating lens and reflector combination is arranged in the light path direction of each light-emitting light source, so that different light-emitting light sources reach the same Powell prism or cylindrical lens combination after being collimated, reflected or transmitted, uniform line laser with different focusing positions is obtained, the depth of the focusing positions is expanded, and the purpose of expanding the depth of field is achieved; the focus position of the multi-light-source change line can keep the original position unchanged, so that the repeatability is better, and the precision is higher; the method is mainly applied to the aspect of machine vision light sources, and has great application value in the aspec