Preparation method of TiN/TiO2/alpha-Al2O3 coating based on high-power pulse magnetron sputtering technology
The invention discloses a TiN/TiO2/alpha-Al2O3 coating preparation method based on a high-power pulse magnetron sputtering technology, which is characterized by comprising the following steps: S1, carrying out ion cleaning on a substrate; s2, stopping in front of the Ti target, and carrying out puls...
Saved in:
Main Authors | , , , , , , , |
---|---|
Format | Patent |
Language | Chinese English |
Published |
04.07.2023
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | The invention discloses a TiN/TiO2/alpha-Al2O3 coating preparation method based on a high-power pulse magnetron sputtering technology, which is characterized by comprising the following steps: S1, carrying out ion cleaning on a substrate; s2, stopping in front of the Ti target, and carrying out pulse reactive sputtering at the power of 8-15kW to obtain a TiN transition layer; s3, stopping in front of the Ti target, and carrying out pulse reactive sputtering with the power of 10-15 kW to obtain a TiO2 transition layer; and S4, stopping in front of the Al target, and carrying out high-power pulse reactive sputtering to obtain an alpha-Al2O3 layer. The TiN/TiO2/alpha-Al2O3 coating prepared through high-power pulse magnetron sputtering has the advantages of being high in hardness, high in thermal stability and low in friction coefficient, the hardness of the obtained multi-layer coating can reach 27 GPa or above, meanwhile, the friction coefficient is lower than 0.1, and high thermal stability and chemical stabil |
---|---|
Bibliography: | Application Number: CN202310352836 |