Capacitor and DRAM device including same
A capacitor is described. The capacitor includes: a lower electrode; the dielectric layer structure is arranged on the lower electrode; and an upper electrode disposed on the dielectric layer structure. The dielectric layer structure includes a first dielectric layer, a second dielectric layer conta...
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Main Authors | , , , , |
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Format | Patent |
Language | Chinese English |
Published |
30.06.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A capacitor is described. The capacitor includes: a lower electrode; the dielectric layer structure is arranged on the lower electrode; and an upper electrode disposed on the dielectric layer structure. The dielectric layer structure includes a first dielectric layer, a second dielectric layer contacting the first dielectric layer, and a third dielectric layer contacting the second dielectric layer. Each of the first dielectric layer, the second dielectric layer, and the third dielectric layer includes a material having a crystal structure. The second dielectric layer includes an oxide having ferroelectric or antiferroelectric properties, and the second dielectric layer includes a material in which at least two different crystalline phases are mixed.
描述了一种电容器。电容器包括:下电极;介电层结构,设置在下电极上;以及上电极,设置在介电层结构上。介电层结构包括第一介电层、接触第一介电层的第二介电层、以及接触第二介电层的第三介电层。第一介电层、第二介电层和第三介电层中的每一个包括具有晶体结构的材料。第二介电层包括具有铁电或反铁电特性的氧化物,并且第二介电层包括混合了至少两种不同晶相的材料。 |
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Bibliography: | Application Number: CN202211657948 |