Photosensitive resin composition for black resist, method for producing same, light-shielding film, color filter, touch screen, and display device
The invention provides a photosensitive resin composition for a black resist, a method for producing the same, a light-shielding film, a color filter, a touch panel and a display device. The photosensitive resin composition for the black resist can form a highly fine pattern, can sufficiently reduce...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
30.06.2023
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Subjects | |
Online Access | Get full text |
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Summary: | The invention provides a photosensitive resin composition for a black resist, a method for producing the same, a light-shielding film, a color filter, a touch panel and a display device. The photosensitive resin composition for the black resist can form a highly fine pattern, can sufficiently reduce reflectivity, and can suppress the generation of agglomerated foreign matters. A photosensitive resin composition for a black resist includes (A) a photosensitive resin containing an unsaturated group, (B) a photopolymerizable compound having at least two unsaturated bonds, (C) a photopolymerization initiator, (D) at least one light-shielding component selected from the group consisting of a black pigment, a mixed color pigment and a light-shielding material, (E) inorganic particles, and (F) a dispersant. The RED value represented by Ra/R0 satisfies a specific condition, where R0 is the interaction radius of the component (F), and Ra is the distance between the Hansen solubility parameter of each component or disp |
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Bibliography: | Application Number: CN202211666146 |